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US Patent Number

9,647,094

Publication Date

5-9-2017

Abstract

A method of manufacturing a semiconductor structure includes the steps of depositing a layer of semiconductor oxide on a base semiconductor layer, scavenging oxygen from the layer of semiconductor oxide and recrystallizing the oxygen scavenged layer of semiconductor oxide as a semiconductor heteroepitaxy layer.

Assignees

University of Kentucky Research Foundation, Lexington, KY (US)

Application Number

13/957,480

Filing Date

8-2-2013

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