Abstract
Impurity-mediated near-infrared (NIR) photoresponse in silicon is of great interest for photovoltaics and photodetectors. In this paper, we have fabricated a series of n+/p photodetectors with hyperdoped silicon prepared by ion-implantation and femtosecond pulsed laser. These devices showed a remarkable enhancement on absorption and photoresponse at NIR wavelengths. The device fabricated with implantation dose of 1014 ions/cm2 has exhibited the best performance. The proposed method offers an approach to fabricate low-cost broadband silicon-based photodetectors.
Document Type
Article
Publication Date
9-4-2017
Digital Object Identifier (DOI)
https://doi.org/10.1186/s11671-017-2287-2
Funding Information
This work was supported by the National Natural Science Foundation of China under grant nos. 61421002, 61574029, and 61371046. This work was also partially supported by the University of Kentucky.
Repository Citation
Zhang, Ting; Liu, Bohan; Ahmad, Waseem; Xuan, Yaoyu; Ying, Xiangxiao; Liu, Zhijun; Chen, Zhi David; and Li, Shibin, "Optical and Electronic Properties of Femtosecond Laser-Induced Sulfur-Hyperdoped Silicon N+/P Photodiodes" (2017). Electrical and Computer Engineering Faculty Publications. 16.
https://uknowledge.uky.edu/ece_facpub/16
Notes/Citation Information
Published in Nanoscale Research Letters, v. 12, issue 1, 522, p. 1-4.
© The Author(s). 2017
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