Year of Publication

2015

Degree Name

Master of Science in Electrical Engineering (MSEE)

Document Type

Master's Thesis

College

Engineering

Department

Electrical and Computer Engineering

First Advisor

Dr. J. Todd Hastings

Abstract

Variable pressure electron beam etching and lithography for Teflon AF has been demonstrated. The relation between dose and etching depth is tested under high vacuum and water vapor. High resolution structures as small as 75 nm half-pitch have been resolved. Several simulation tools were tested for surface plasmon excitation. Grating based dual mode surface plasmon excitation has been shown numerically and experimentally.

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