Archived
This content is available here strictly for research, reference, and/or recordkeeping and as such it may not be fully accessible. If you work or study at University of Kentucky and would like to request an accessible version, please use the SensusAccess Document Converter.
Date Available
4-23-2015
Year of Publication
2015
Document Type
Master's Thesis
Degree Name
Master of Science in Electrical Engineering (MSEE)
College
Engineering
Department/School/Program
Electrical and Computer Engineering
Faculty
Dr. J. Todd Hastings
Faculty
Dr. Cai-Cheng Lu
Abstract
Variable pressure electron beam etching and lithography for Teflon AF has been demonstrated. The relation between dose and etching depth is tested under high vacuum and water vapor. High resolution structures as small as 75 nm half-pitch have been resolved. Several simulation tools were tested for surface plasmon excitation. Grating based dual mode surface plasmon excitation has been shown numerically and experimentally.
Recommended Citation
Sultan, Mansoor A., "ELECTRON-BEAM PATTERNING OF TEFLON AF FOR SURFACE PLASMON RESONANCE SENSING" (2015). Theses and Dissertations--Electrical and Computer Engineering. 66.
https://uknowledge.uky.edu/ece_etds/66
Included in
Electrical and Electronics Commons, Electromagnetics and Photonics Commons, Nanotechnology Fabrication Commons
